Vol. 6, №1, 2014
РусскийEnglish

NANOSYSTEMS



RESONANCE PHENOMENA IN THE MAGNETRON SPUTTERING OF METAL NANOFILMS IN A LOCAL FIELD ON THE SUBSTRATE
Grachev Vladimir I.
Scientific and Production Company "AVERS", www.aversnpk.ru
101000 Moscow, Russian Federation
aversnpk@mail.ru
Margolin Vladimir I., Tupik Viktor A.
Saint-Petersburg State Electrotechnical University "LETI" n. a. V.I. Ulyanov (Lenin), www.eltech.ru
197376 Saint-Petersburg, Russian Federation
v.margolin@mail.ru, VATupik@etu.ru

Received 10.04.2014
The results of experimental studies on ion magnetron sputtering of metal nanofilms in an electromagnetic field. This field is generated by the curvilinear diffraction grating which is disposed below the substrate in the fixed contact. Synthesized films were studied by the methods optical and electron microscopy. Found multilayer film structure with layers of a few nanometers. Each layer has a fine-grained structure with a grain size from 0.1 to 10 microns. Figure of location of grains repeats pattern of the diffraction grating. X-ray-phase analysis and atomic force microscopy of the obtained films showed a domed structure of grains of different hierarchical level. The structure of each subsequent layer is the likeness of the previous layer. Assuming fractality of synthesized films are calculated their fractal dimension. Found effect of the film replication: sputtered film successfully "plays the role of" of the diffraction grating. Discusses the possible resonance phenomena during deposition of films in the proposed conditions.

Keywords: magnetron sputtering, metal films, diffraction grating, fractals, resonance

UDC 538.95.678.5-419

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RENSIT,
2014, 6(1):18-29
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